Larsson K. Chemical Vapour Deposition. Growth Processes on an Atomic Level 2022

Textbook in PDF format

Chemical vapour deposition (CVD) is a vacuum deposition method used to produce high-quality, high-performance, solid materials. This is the first book to cover CVD growth processes at the atomic level using a combination of theoretical and experimental tools, including density functional theory (DFT) calculations. By demonstrating the methodology behind the modelling and simulation of CVD growth processes, the text provides guidance and practical advice on how to acquire successful theoretical results. Worked examples, case studies, end-of-chapter summaries and animations of atomic-level surface processes are included to aid learning. After reading this text, researchers and students will have the knowledge they need to tailor-make desired growth processes for the deposition of materials with specific properties.
Key Features
Covers CVD growth processes at the atomic level using a combination of theoretical and experimental tools.
Provides the knowledge required to tailor-make desired growth processes for the deposition of materials with specific materials properties.
Covers the main principles of CVD and the growth processes of the most common types of materials.
Enables the reader to design new experimental setups, develop new materials with specific properties, interpret experimental results, and develop theoretical tools.
Includes worked examples, case studies, end-of-chapter summaries and animations of atomic-level surface processes.
Common CVD reactor setups
CVD processes on an atomic level
Theoretical methods and methodologies
Construction of solid surface models
Thermodynamic modelling of CVD growth processes
Identification of growth mechanisms for ALD deposition of Cu
Prerequisites for vapour phase growth of phase pure cubic BN
Effect of substrates on the vapour phase growth of thin film materials
Construction of growth reaction pathways
Other types of material growth in a CVD reactor